Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon
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چکیده
منابع مشابه
Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon
Porous silicon layers were elaborated by electrochemical etching of heavily doped p-type silicon substrates. Metallization of porous silicon was carried out by immersion of substrates in diluted aqueous solution of nickel. Amorphous silicon thin films were deposited by plasma-enhanced chemical vapor deposition on metalized porous layers. Deposited amorphous thin films were crystallized under va...
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ژورنال
عنوان ژورنال: Nanoscale Research Letters
سال: 2012
ISSN: 1556-276X
DOI: 10.1186/1556-276x-7-464